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Target for forming highly refractive film

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Sputtering target comprises substrate and target material comprising metal oxide MO(x) (M = Ti, Nb, Ta, Mo, W, Zr or Hf) which is deficient in oxygen compared with stoichiometric.

Target for magneto-optical recording medium

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Target for magnetron sputtering

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Target for magnetron sputtering nickel for forming consistent metallizing films.

Target for magnetron sputtering of aluminium for forming metallization films with low defect densities

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Target adapted to be received by DC magnetron PVD system has deposition producing portion of elec. conductive coating metal.

Target for PVD system

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Target for sputter cathode in vacuum coating apparatus

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Target material of metal silicide

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Target medium for diamond film deposition

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Deposition target medium for CVD of diamond film with use of hydrocarbon gas and H, target medium has Young's modulus <50GPa. Coating on substrate comprises binder and diamond grit.

Target mounting and demounting arrangement

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Target mounting apparatus for vapour deposition system

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Target of High-Purity Nickel or Nickel Alloy and its Producing Method

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A target of high purity nickel or a nickel alloy for magnetron sputtering by which a sputter film excellent in uniformity is formed. The target is characterized by exhibiting a permeability of 100 or more. Use of such a target improves the uniformity of the film and the ignitability of the plasma even in the manufacturing process using a 300 mm wafer. A method for producing such a target is also described..

Target production and method for forming high refractive index films

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Sputtering target comprises substrate and target material comprising oxygen-deficient metal oxide MO(x) (M = Ti, Nb, Ta, Mo, W, Zr or Hf).

Target, Process for Production thereof, and Method of Forming Highly Refractive Film

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A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of refractive metals Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Targeted bombardment - effect of parameters in abrasive blasting of surfaces of different materials

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Tarnish & Corrosion of Dental Gold Alloys

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Summary of tarnish tests incl. immersion in sulphide solutions or exposure to vapour for a range of Au alloys (up to 75% Au) with analyses given. Spectrophotometric (colorimetric) &reflectance data was used to assess degree of tarnish. In separate study, potentiodynamic corrosion test was carried out.Mechanism of corrosion in these materials is discussed. 31 refs.