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Tantalum coating on porous Ti6Al4V scaffold using chemical vapor deposition and preliminary biological evaluation.

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Porous tantalum (Ta), produced via chemical vapor deposition (CVD) of commercially pure Ta onto a vitreous carbon, is currently available for use in orthopedic applications. However, the relatively high manufacturing cost and the incapability to produce customized implant using medical image data have limited its application to gain widespread acceptance. In this study, Ta film was deposited on porous Ti6Al4V scaffolds using CVD technique. Digital microscopy and scanning electron microscopy indicated that the Ta coating evenly covered the entire scaffold structure. X-ray diffraction analysis showed that the coating consisted of a and á phases of Ta. Goat mesenchymal stem cells were seeded and cultured on the Ti6Al4V scaffolds with and without coating. The tetrazolium-based colorimetric assay exhibited better cell adhesion and proliferation on Ta-coated scaffolds compared with uncoated scaffolds. The porous scaffolds were subsequently implanted in goats for 12 weeks. Histological analysis revealed similar bone formation around the periphery of the coated and uncoated implants, but bone ingrowth is better within the Ta-coated scaffolds. To demonstrate the ability of producing custom implant for clinical applications via this technology, we designed and fabricated a porous Ti6Al4V scaffold with segmental mandibular shape derived from patient computerized tomography data.

Tantalum coating on TiO2 nanotubes induces superior rate of matrix mineralization and osteofunctionality in human osteoblasts.

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Tantalum coatings for inertial confinement fusion dry wall designs

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Tantalum coatings (1 mm thick) were plasma sprayed onto ferrite steel tubes and then subjected to 100 heating/cooling cycles to simulate the equivalent of 5 years thermal cycling in a fusion reactor environment. The coatings were undamaged and remained bound to the substrate.

Tantalum coatings for the petrochemical industry

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Ta coatings have never been cost attractive for petrochemical industry but corrosion resistant Ta coatings are very cost effective solution for complex metallurgical applications. There are environments were thermally sprayed Ta has little or no competition from coatings. Ta technology is reviewed for petrochemical priorities. Selected properties of both Ta and Ta pentoxide are given along with brief history of Ta and Ta coatings.

Tantalum coatings on steel by vacuum plasma spraying (German)

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Conditions for vacuum plasma spraying of tantalum were established and coating quality evaluated with regard to chemical composition, adhesion strength, density and corrosion behaviour. It was necessary to have high plasma power and optimal injection of Ta powder into the plasma torch to achieve high quality coatings. The coatings exhibited good adhesion but poor ductility. Corrosion resistance was not as good as that of compact Ta possibly due to a high oxygen content unlike plasma sprayed titanium coatings where the corrosion resistance was comparable to compact titanium.

Tantalum films

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CVD of Ta or Ta based film using Ta halide precursor and maintaining temp. at 70-675°C.

Tantalum nitride atomic layer deposition using (tert-butylimido)tris (diethylamido) tantalum and hydrazine.

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JES

Tantalum nitride films grown by inorganic low temperature thermal chemical vapour deposition. Diffusion barrier properties in copper metallization

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JES

Tantalum oxide CVD films

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Ta oxide film is formed on substrate by CVD with Ta compound containing hydrogen & alkyl groups.

Tantalum oxide effect on the surface structure and morphology of the IrO2 and IrO2 + RuO2 + TiO2 coatings and on the corrosion and electrochemical properties of anodes prepared from these.

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RUS

Tantalum oxynitride thin films: Mechanical properties and wear behavior dependence on growth conditions.

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Tantalum pentoxide coatings

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Substrates with fresh OH groups, e.g., silicaceous and aluminous materials, are rendered corrosion resistant by application of amorphous homogeneous Ta pentoxide coating.

Tantalum pentoxide coatings

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Corrosion resistance is imparted to substrate with free surface hydroxyl groups by coating is coextensively with partially hydrolyzed soln. of Ta alkoxide inorganic solvent, evaporating solvent to yield Ta oxide-ethoxide film, and curing film to yield uniform, amorphous Ta pentaoxide layer.

Tantalum plasma etching with minimum effect on underlying nickel-iron thin film

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Removing Ta from NiFe surface in methane-oxygen plasma was demonstrated to be more robust process than Ar ion milling in preserving and controlling NiFe magnetic thickness during Ta over etch. Factorial study showed that NiFe magnetic thickness loss could be further reduced by replacing CF4 with CHF3 and reducing oxygen flow. For optimized CHF3/CF4 process, NiFe magnetic thickness loss for 100-A Ta over etch was only 5 . Electron spectroscopy for chemical analysis showed the presence of the fluorocarbon on the CF4/CHF3 etched Ta surface and NiF2 on NiFe surface after Ta over etch. Mechanism of removing Ta with min. effect on underlying NiF2 thin film was proposed.

Tantalum Plating by Magnetron Sputtering and its Coating Characteristic.

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Tantalum films were deposited on aluminium and glass substrates by D.C. magnetron sputtering. The influence of process conditions on tantalum films properties and thickness, including Ar pressure, cathode current, base pressure of chamber, sputtering time, and so on, were researched. The physical and electrical properties of tantalum film were also studied. The results show that the thickness of tantalum film is mainly related to the power of tantalum target, the partial pressure of Ar gas and the sputtering time, and the thickness of tantalum films is approximately directly proportional to the sputtering time with Ar gas pressure and current density being fixed. Five tantalum plating samples obtained on aluminium substrates with 3 A/(8 min), 4 A/(6 min), 5 A/(3 min) were used to make the receiving box for medical CT, and the electrical signals of X-ray acquired were 300 thousand, 320 thousand and 340 thousand unit respectively, reaching and exceeding the international technical standard of the same type of products.