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Vacuum apparatus for surface treatment

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Vacuum Arc Deposition

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Vacuum arc deposition and microstructure of ZrN-based coatings

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SURF Thin coatings of ZrN, and bilayer coatings titanium nitride/ZrN and ZrN/titanium nitride < 3µm thick were deposited using triple-cathode vacuum arc plasma gun connected to a straight plasma duct, where an axial magnetic field was imposed. The substrates were cemented carbide bars, having a composition of 90% WC, 1.8% TaC, 0.2% NbC, and 8% Co.Coatings were deposited with arc current 200 A, background N2 pressure 0.4-2 Pa, substrate temp. 200 to 600 °C, and substrate bias voltages in 0 to -200 V. Magnetic field in duct was 1-10 mT. Structure and composition of coating and interface morphology were studied. For N2 pressures > 0.4 Pa single-phase ZrN coating with NaCl-type structure was obtained. Microstructure of ZrN coatings and ZrN and titanium nitride layers of bilayer coatings was composed of (111) oriented columnar grains, although near coating-substrate interface randomly oriented grains were observed. In bilayer coatings sharp interface between titanium nitride and ZrN layers was observed. Pref. grain orientation was independent of substrate bias voltage and temp. However, coating grain size increased with substrate temp. and decreased with substrate bias voltage. Cobalt diffused from cemented carbide substrate to free surface of coating, and concn. there increased with deposition temp.

Vacuum arc deposition apparatus

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Apparatus comprising cylindrical evaporation source; substrate positioned around source to (partially) axially overlap source; cathode of arc power source connected to at least 1 end of source; and magnetic field forming exciting coil with axis coaxial with cylindrical axis of source.

Vacuum arc deposition of nickel - titanium gradient coatings

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Vacuum arc deposition of thin films

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Title process is discussed, in terms of cathode burning region, comparison between glow-discharge and arc discharge, and between atmospheric and vacuum processes. Graph plots target melting point vs. strike voltage. Topography of arc discharge is sketched, and for carbon cathode, kinetic energies are shown for DC arc, laser arc and HCA as function of current density, and for pulsed & unpulsed. Effect of carbide & nitride on melting point of metallic targets is shown. Vacuum arc coating & its applications are discussed. Use of lamellar filter for precision coating is detailed. Laser arc sources with plasma filtration are shown. Vacuum arc and magnetron sputtering are compared. 45 refs

Vacuum arc deposition of thin films from a Lanthanum Boride cathode

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SURF Hot-pressed LaB6 cathode was used to deposit thin films by reactive cathodic arc evaporation in residual gas and in nitrogen atmos. Layers consist of matrix phase in which polycrystalline LaB6 macro particles are embedded. Matrix phase of non-reactively deposited films is mainly La and B, together with some carbon and oxygen from residual gas. Layers deposited in N contain B-N and B-O bonds. Electron diffraction reveals small cubic and hexagonal BN crystallites within amorphous matrix phase. However, IR spectroscopy confirms only existence of hexagonal BN.

Vacuum Arc Evaporation Coating Chamber

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Vacuum arc evaporation source & deposition apparatus

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Claims to minimise molten particles reaching work surface by vertical orientation of magnetic field.

Vacuum arc evaporation source and deposition apparatus.

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Vacuum arc evaporation with programmable erosion and deposition profile

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SURF Advanced vacuum dc-arc evaporation unit, consisting of broad area flat cathode and computer controlled array of magnetic coils, is described. Such magnetic array can control erosion area within well defined pattern. System is useful for increasing cathode-lifetime due to prevention of inhomogeneous erosion. Programmable arc evaporation unit can be used to solve special deposition problems, e.g. deposition with predefined thickness profile; also to increase area of homogeneous deposition. System was tested on industrial deposition plants and is available.

Vacuum Arc Plasma Coating Device

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Vacuum arc plasma source

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Apparatus comprises rectangular planar cathode plate and anode at right angles to it, long side of cathode being bevelled inwardly toward working surface of cathode plate; means for igniting elec. arc; and magnetic stabilising system comprising linear conductors in parallel to long sides for producing static magnetic field and groups of linear conductors perpendicular to working surface of cathode plate, activated in sequence, to produce dynamic magnetic field.

Vacuum Arc Vapour Deposition Chamber

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Vacuum arc vapour deposition electrode

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