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Washing and drying apparatus

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Articles placed horizontally on carrier are immersed in washing liquid, carried vertically upwards while oscillating them and feeding drying gas.

Washing and drying method

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Method comprises dipping material to be washed into aq. soln. containing surfactant having water repellency so that molecular layer is attached to material surface, then drying.

Washing and drying method

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Washing drying method comprising dipping material in aq. soln containing hydrocarbon surfactant(s) having C112-C18 hydrophobic alkyl group, F surfactant(s) having C6-C12 fluorinated alkyl group or hydrophobic Si surfactant(s) so that _1 molecular layer of surfactant is attached to surface, then drying.

Washing and drying of articles

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Article is cleaned in azeotropic liquid containing C(1-6) alcohol and water at >100°C, followed by drying.

Washing and drying substrates

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Method comprises dipping substrates together with chuck in washing liquid in processing vessel; then transferring them from chuck onto wafer at at top of vessel; moving boat to position substrates in lower region of vessel; discharging washing liquid from upper region; and supplying fresh washing liquid into lower region causing it to overflow; and taking out washed substrates.

Washing and rinsing used lithographic plate members

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Cleaning, storing and unsealing lithographic plate member(s) with preformed peripheral flanges and ink residues and other contaminants on surface by removing plate member(s) from press plate drum, placing it on feed fixture, scrubbing, rinsing, further rinsing and scrubbing, removing excess rinse liquid, sealing with water soluble preserving substance which enables removal during subsequent press run from press's own water train, receiving plate member from removal fixture and storing it until reuse.

Washing Apparatus

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Articles are washed in detergent with nonionic surfactant & terpene based solvent, water rinsing, return of filtered water to rinse bath in 2-stage filter with sub-micron filter followed by activated carbon.

Washing apparatus

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Apparatus comprises spin chuck for holding and rotating substrate, washing means incl. applying physical force to contaminants; supporting arms; and driving mechanism; and control means.

Washing apparatus

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Washing apparatus comprising spin chuck for rotatably holding substrates; nozzle; soln temp. controlling means, cover and cover transfer means.

Washing apparatus and apparatus for fabricating plating-filmed web.

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Following electroplating & metallising of web film, with electrically conductive cathode roller, on continuous basis, rinsing of film from plating solution is carried out

Washing apparatus and method

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Article is washed in detergent comprising non-ionic surface active agent and terpene based solvent.

Washing both sides of substrate

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Rotating substrate is scrubbed with washing liquid back and front; and heated to dry substrate. Recipe is given for determining time of heating.

Washing coins

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Coin washing method comprises introducing coins into washing machine so that they do not overlap, washing one side, turning and washing other side; removing washing liquid; drying and discharging coins.

Washing device for complex profile components

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Device provides ascending stream of washing liquid and has bath consisting of concentric vertical cylinders with impeller fixed to bottom of internal cylinder and holes along perimeter of upper part of outer cylinder.

Washing device for substrates

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